RENA Technologies GmbH
Booth number: N93038
www.rena.com
About us
RENA Technologies is a leading global supplier of production machines for wet chemical surface preparation. RENA products are used in path-breaking application fields such as semiconductors, MedTech, renewable energies, the glass industry and additive manufacturing. RENA equipment is used to treat or modify surfaces of, for example, semiconductor wafers, solar cells, glass, optical substrates, 3D-printed metal components or other high-tech products using wet chemical processes. RENA offers proven standard machines as well as customer-specific solutions and process support.
Address
Höhenweg 1
78148 Gütenbach
Germany
E-mail: info@rena.com
Phone: +49 7723 93130
Internet: www.rena.com
3838 Western Way NE
97321 Albany, OR
United States
E-mail: sales-na@rena.com
Phone: +1 541 917-3626
Internet: www.rena-na.com/
Contact person:
Michael Vees
Sales Director Solar
E-mail: info@rena.com
Phone: +49 7723 93130
Products & Services
Your partner for TOPCon, IBC, and Heterojunction
To produce high efficiency solar cells, you always need one thing: excellent workmanship, specifically for guaranteeing perfectly aligned surface structures and maximum cleaning efficiency.
RENA systems employ a genuinely standard- setting technology for these challenging manufacturing processes:
Underpinned by our process and technology expertise, our machinery makes maximumefficiency solar cells following either the inline or batch method.
BatchTex®
Standard or customized for your application - high volume performance using RENA’s proven modules: RENA‘s next level batch tool platform Batch N50 lab (manual) or pilot (automatic) system has a bath capacity of 50 wafers per bath.
Batch N400 standard 400-wafers-batch-size system, with 8,000 wafers/h gross for full-size and up to 15,000 wafers/h gross for half-cut. Batch N600 high volume 600-wafers-batch-size system, with 15,000 wafers/h gross for full-size and up to 30,000 wafers/h gross for half-cut.
InEtchSide 4+
The RENA InEtchSide automated processing equipment is designed for ultra-high throughput removal of silicon oxide layers and doped glasses (e.g. PSG or BSG).
The proven and optimized, patented single side etching process ensures lowest chemical front side attack. This is used in the fabrication of high efficiency solar cell concepts, like IBC, TOPCon, PERC and others.
The tool is based upon the RENA inline platform.
