NXT GmbH
Booth number: N-92036
www.nxt91.com/
About us
Identifying deviations in the production process is our focus.
We develop and manufacture spectrometric measuring systems for non-contact processes and quality control across various high-tech industries.
Our INLINE and OFFLINE systems follow a consistent measuring principle, are modular in design, and can be individually configured. With comprehensive training and technical support, we have been assisting manufacturers of high-tech products worldwide with their quality assurance for over 30 years.
Address
Borsigstrasse 78
52525 Heinsberg
Germany
E-mail: info@NXT91.com
Phone: +49 2452 9600110
Internet: www.nxt91.com/
Contact person:
Products & Services
NXT’s spectrometric measuring systems are used for quality assurance in various high-tech industries. Our Helios series enables you to precisely control texturing, etching and coating processes in the production of various solar wafers. With our TCM series you can control thin layers and insulation layers in the production of lithium batteries. All measuring systems are available as compact INLINE devices for your production line as well as OFFLINE table-top devices.
Helios-rc
For controlling texturing and etching processes of solar wafers
INLINE compact system for your production line or OFFLINE table-top system,
motorized scanning or manual operationMeasurement of reflectance ( r ) and color ( c )
Measures:
Spectral reflectance (working distance: 1 mm, angular range: ± 84°)
Spatial angle reflectance (working distance: 1 mm – 10 mm, angular range 84°- 42°)
Spectral values (lambda range: VIS: 380 – 1050 nm, VIS_ext: 360 – 1050 nm)
Color spaces: Lab / Luv / LCH / xyY / XYZ / Yab
Layer thicknesses: 5 – 200 nm (material-dependent variation: SiNx, AlOx, SiOx)
Measuring speed per point: ≤ 100 ms
Measuring spot size (round): approx. 4 mm
Working distance to the solar wafer: approx. 1 – 10 mm
Helios-tn
For controlling coating processes of silicon-based solar wafers
INLINE compact system for your production line or OFFLINE table-top system,
motorized scanning or manual operationMeasurement of coating thickness ( t ) and refractive index ( n )
Measures:
Spectral values (lambda range: VIS: 380 – 1050 nm)
Layer thickness of individual layers: 30 – 300 nm (depending on material)
Refractive index n&k of single layers: 1.4 - 4.5 (depending on material)
For double layers: layer thickness and refractive index n&k of one layer, or
layer thickness of both layers and refractive index n&k of one layer
(range of total thickness: 50 – 300 nm)
– Measuring speed per point:
≤ 200 ms (spectrum acquisition)
≤ 200 ms (single layer evaluation)
≤ 500 ms (double layer evaluation)
– Measuring spot size (elliptical): approx. 5 x 8 mm
– Working distance to the solar wafer: approx. 10 mm
Helios-r8
For controlling poly-Si coatings on TOPCon solar wafers
INLINE compact system for your production line or OFFLINE table-top system,
motorized scanning or manual operationLight measurement with 8 individual fibers in a specific angle range
to determine the reflectance ( r )
– Measures:
Spectral values (lambda range: VIS: 380 – 1050 nm)
Layer thickness per layer material Poly-Si: 50 – 450 nm
Refractive index n&k per layer material Poly-Si: 3.0 - 4.5
– Measuring speed per point: ≤ 200 ms
– Measuring spot size (round): approx. 20 mm
– Working distance to the solar wafer: approx. 17 mm
TCM
For controlling thin layers and insulation layers in lithium battery production
INLINE system for your production line or OFFLINE table-top system,
motorized scanning or manual operationMeasures:
Layer thickness of insulation layers (wet film)
Layer thickness of insulation layers (dry film)
– Measuring speed per point: 2 ms
– Repetition rate: 30 measurements/s
– Measuring spot size: approx. 1 mm
– Working distance to the measuring sample: approx. 14 mm
