With the latest system generation GENERIS PVD, SINGULUS TECHNOLOGIES can assure capacities up to 8,000 wafers per hour of G12 HJT cells. There are further savings due to the smaller footprint of the equipment and related smaller building and cleanroom space requirements. The dual-sided processes of the GENERIS PVD require less wafer handling resulting in reduced wafer breakage, wafer damage and wafer marks. SINGULUS TECHNOLOGIES takes advantage of in-house engineering of crucial components such as sputtering magnetrons, simulation and optimization of different sputtering processes and processes developed using state-of-the-art sputtering lab equipment at SINGULUS TECHNOLOGIES R&D center. Newly developed processes can be directly industrialized to the GENERIS PVD mass production platform.