Single-Side Oxide Etching

High-throughput rear-side oxide etching for next-generation solar cells

The RENA InEtchSide is an automated inline system for the high-throughput removal of silicon oxide layers and doped glass coatings such as PSG (Phosphosilicate Glass) and BSG (Borosilicate Glass). Its patented single-side etching technology reliably removes rear-side layers while minimizing chemical attack on the front side, ensuring excellent process stability and high product quality.

Developed for advanced high-efficiency solar cell architectures including IBC, PERC, TOPCon, and other next-generation concepts, the system combines outstanding throughput with precise and reproducible process results.

The InEtchSide is built on the proven RENA NIAK 4 inline platform, providing a robust and scalable solution for modern photovoltaic manufacturing.