For controlling coating processes of silicon-based solar wafers

• INLINE compact system for your production line or OFFLINE table-top system,
  motorized scanning or manual operation

• Measurement of coating thickness ( t ) and refractive index ( n )

• Measures:

1. Spectral values (lambda range: VIS: 380 – 1050 nm)

2. Layer thickness of individual layers: 30 – 300 nm (depending on material)

3. Refractive index n&k of single layers: 1.4 - 4.5 (depending on material)

4. For double layers: layer thickness and refractive index n&k of one layer, or
   layer thickness of both layers and refractive index n&k of one layer
   (range of total thickness: 50 – 300 nm)

– Measuring speed per point:

≤ 200 ms (spectrum acquisition)

≤ 200 ms (single layer evaluation)

≤ 500 ms (double layer evaluation)

– Measuring spot size (elliptical): approx. 5 x 8 mm

– Working distance to the solar wafer: approx. 10 mm