The Helios-tn systems are ideally suited for monitoring and controlling coating processes on silicon-based solar wafers. They offer highly precise measurements of layer thickness and optical constants (n&k) across single and multiple layers, with the ability to measure 2 – 3 parameters simultaneously.

The INLINE-tn system is designed for real-time measurements within production environments. It features tunable optics that adapt to the surface structures of the wafers, ensuring consistent and accurate inline performance.

The OFFLINE-tn systems provide flexibility for research, process development, and sample inspection.

These configurations include motorized x-y mapping (SCAN-tn) or manual operation (LAB-tn) for detailed analysis of wafer surfaces.