Helios-rc systems are designed for precise monitoring and control of texturing and etching processes on solar wafers. These systems measure the total reflectance of the textured front side and the spatial angle reflectance of the back side of the wafer to ensure optimal surface treatment. Additionally, they can measure the thickness of thin layers on either the front or back of the wafer, supporting comprehensive surface analysis.

The INLINE-rc system is built for seamless integration

into production environments. It supports measurements on moving wafers, features adjustable working distances, and includes motorized reference samples to ensure accuracy and repeatability during continuous operation.

The OFFLINE-rc systems are ideal for sample inspection and process development. Configurations include motorized

scanning (SCAN-rc) and manual operation (LAB-rc), both equipped with integrated reference standards to ensure long-term measurement stability.